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Tantalum (Ta) Sputtering Targets
Elevate your PVD process with our high-performance Tantalum (Ta) sputtering targets, the industry standard for demanding thin-film applications. Known for its exceptional corrosion resistance and a melting point of , Tantalum is the ideal material for crucial barrier layers in semiconductors and high-reliability capacitors. We deliver high-density targets with high-purity in both planar and rotary geometries to ensure stable, uniform deposition and maximum target utilization for your advanced electronics and medical device manufacturing.
Experience Unmatched Quality and Performance
Key Features of Our Tantalum (Ta) Sputtering Targets
Extreme Durability
Ultra-high melting point and superior corrosion resistance for stable sputtering in harsh environments.
Semiconductor Essential
The material of choice for diffusion barrier layers and advanced thin-film capacitors in microelectronics.
Flexible Formats
Available in high-density planar and rotary targets with options for Copper, Moly, or Stainless Steel backing plates.
Tantalum (Ta) Technical Information
| Purity | Melting Point | Hardness | Yield Strength/Tensile | Available Geometries | Backing Plate Options |
|
3,017 °C | 6.5 | 170-300MPa |
|
Planar:
Rotatable:
|
About Our Manufacturing Excellence
Ensure peak performance for your deposition process with our precise Tantalum sputtering targets. Our commitment to controlled microstructure and high purity minimizes film defects and particle generation, critical for achieving highly uniform films in high-volume electronics and medical device production. Choose our reliable Ta targets to guarantee consistency across all your demanding applications.
Our Specialized Services
Comprehensive Solutions for Your Needs
Indium Bonding
Our expert indium bonding service ensures optimal thermal and electrical conductivity for your sputtering targets, enhancing performance and longevity.
Custom Configurations
We offer tailored configurations to meet the specific requirements of your application, ensuring seamless integration and maximum efficiency.
Multi-Tile Assemblies
Our multi-tile assemblies are designed for both planar and rotary applications, providing versatility and adaptability for complex projects.
Rotary Target Manufacturing
Specializing in rotary target manufacturing, we deliver precision-engineered solutions that meet the highest industry standards.
Planar Target Solutions
Our planar target solutions are crafted with precision to support a wide range of thin film applications, ensuring superior performance.
Evaporative Materials
We supply high-quality evaporative materials that are essential for efficient thin film deposition processes across various industries.
Backing Plates and Tubes
Our durable backing plates and tubes are designed to support your sputtering targets, ensuring stability and reliability during operations.
Transparent Conductive Oxides
We develop advanced transparent conductive oxides like AZO and GZO, tailored for photovoltaic and display applications.
Get in Touch Today
Contact us to learn more about our high-quality Tantalum (Ta) sputtering targets and how we can support your specific application needs. Request a quote today!